Bit-patterned magnetic media formed in filler layer recesses

ABSTRACT

A recessed field is formed surrounding resist columns that are in a pattern of bit patterned magnetic media. A filler layer is formed in the recessed field. The resist columns are removed to leave recesses in the filler layer that replicate the pattern. Bit patterned magnetic media is formed in the recesses.

CROSS-REFERENCE TO RELATED APPLICATION

The present application is a divisional of and claims priority of U.S.patent application Ser. No. 12/175,607, now U.S. Pat. No. 8,021,713filed Jul. 18, 2008, the content of which is hereby incorporated byreference in its entirety.

FIELD

The present invention relates generally to bit patterned magnetic datastorage media, and more particularly but not by limitation to providingbit patterns for such media.

BACKGROUND

Bit patterned recording media comprises an array of magnetic islandsthat are spaced apart from one another on a media surface. The spacesbetween the patterned islands are filled with a non-media material toprovide a smooth surface for the read/write head to fly over. Thenon-media material separates the magnetic islands from one another. Themagnetic islands can be round, oval or another shape. A bit of data isrecorded on one or more of the islands. In known bit patterned recordingmedia, a filler material is provided, pits or cavities are then providedin the filler material by etching or by using a stamper, and thenmagnetic recording material is deposited in the pits or cavities. Theprocess of providing the pits or cavities by stamping or etching iscomplex, expensive and difficult to control.

Embodiments of the present invention provide solutions to these andother problems, and offer other advantages over the prior art.

SUMMARY

In a process described below, a recessed field is formed surroundingresist columns. The resist columns are in a pattern of bit patternedmagnetic media. A filler layer is formed in the recessed field. Theresist columns are removed to leave recesses in the filler layer. Therecesses in the filler layer replicate the pattern. Bit patternedmagnetic media is formed in the recesses.

According to one aspect, the filler material comprises spun on glass(SOG) that is heated to convert the spun on glass to silicon dioxide.According to another aspect, a release monolayer is provided on uppersurfaces of the resist columns to resist wetting by the spun on glass.

According to yet another aspect, the bit patterned magnetic media isformed on a seed layer.

Other features and benefits that characterize embodiments of the presentinvention will be apparent upon reading the following detaileddescription and review of the associated drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is an isometric view of a disc drive.

FIG. 2 illustrates a cross-sectional view of a portion of a disc at afirst process step in manufacturing of a storage media disc.

FIGS. 3A, 3B illustrate a portion of a disc at a second process step inmanufacturing of the storage media disc.

FIGS. 4A, 4B illustrate a portion of a disc at a third process step inmanufacturing of the storage media disc.

FIGS. 5A, 5B illustrate a portion of a disc at a fourth process step inmanufacturing of the storage media disc.

FIGS. 6A, 6B illustrate a portion of a disc at a fifth process step inmanufacturing of the storage media disc.

FIGS. 7A, 7B illustrate a portion of a disc at an optional sixth processstep in manufacturing of the storage media disc.

DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS

In the process described in FIGS. 2-7A, B below, a substrate isprovided. A seed layer is disposed on the substrate, and a resist layeris shaped to form resist columns. A recessed field is formed surroundingthe resist columns. The resist columns are in a pattern of bit patternedmagnetic media. A filler layer is formed in the recessed field. Theresist columns are removed to leave recesses in the filler layer. Therecesses in the filler layer replicate the pattern of bit patternedmagnetic media. Bit patterned magnetic media is formed in the recesses.

According to one aspect, the filler material comprises spun on glass(SOG) that is later heated to convert the spun on glass to silicondioxide. According to another aspect, a release monolayer is provided onupper surfaces of the resist columns to resist wetting by the spun onglass on top of the resist layer. According to yet another aspect, thebit patterned magnetic media is formed on a seed layer. A resultingstorage media disc includes bit patterned media dots (also called bitsor islands) that are formed in recesses that have not been formed byetching or stamping. The recesses have well defined, controlled shapesand sizes that are easily and economically formed. The undesiredvariabilities of stamping or etching recesses are avoided.

FIG. 1 is an isometric view of a disc drive 100 in which embodiments ofthe present invention are useful. Disc drive 100 includes a housing witha base 102 and a top cover (not shown). Disc drive 100 further includesa disc pack 106, which is mounted on a spindle motor (not shown) by adisc clamp 108. Disc pack 106 includes a plurality of individual discs,which are mounted for co-rotation in a direction 107 about central axis109. The individual discs in the disc pack 106 comprise bit patternedmedia discs, which are described in more detail below in connection withFIGS. 2-7A, B. Each disc surface has an associated disc head slider 110which is mounted to disc drive 100 for communication with the discsurface. In the example shown in FIG. 1, sliders 110 are supported bysuspensions 112 which are in turn attached to track accessing arms 114of an actuator 116. The actuator shown in FIG. 1 is of the type known asa rotary moving coil actuator and includes a voice coil motor (VCM),shown generally at 118. Voice coil motor 118 rotates actuator 116 withits attached heads 110 about a pivot shaft 120 to position heads 110over a desired data track along an arcuate path 122 between a disc innerdiameter 124 and a disc outer diameter 126. Voice coil motor 118 isdriven by servo electronics 130 based on signals generated by heads 110and a host computer (not shown).

FIG. 2 illustrates a cross-sectional view of a portion of a disc 200 ata first process step in manufacturing of a storage media disc 600 (FIGS.6A, 6B). The disc 200 comprises a substrate 202. The substrate 202provides mechanical support for subsequent layers formed in place on thesubstrate 202.

A seed layer 204 is disposed on the substrate 202. The seed layer 204comprises a metal surface upon which a growth of a subsequent magneticmedia layer 240, 242, 244 (FIGS. 6A, 6B) can be initiated.

An undeveloped photoresist layer 206 is disposed on the seed layer 204.The undeveloped photoresist layer 206 comprises a photosensitive resistmaterial. The undeveloped photoresist layer 206 can be spun on, vaporcoated, or deposited by other known means of application ofphotoresists.

According to one aspect, a release monolayer 208 is disposed on theundeveloped photoresist layer 206. The release monolayer 208 resistsadhesion of a filler layer 230 (FIGS. 4A, 4B) to a top surface of thephotoresist layer 206 as described in more detail below in connectionwith FIGS. 4A, 4B. The release monolayer 208 provides the desiredsurface interface characteristics for controlling deposition of thefiller layer 230. The release monolayer 208 is typically only onemolecule thick and does not interfere with subsequent exposure of theundeveloped photoresist layer 206 and is present after the photoresistis subsequently developed.

While the release monolayer 208 is shown in place in FIG. 2, it will beunderstood that the release monolayer 208 can be alternatively appliedat other steps in the process sequence. For example, it can be appliedafter completion of steps shown in FIGS. 4A, 4B and before completion ofsteps shown in FIGS. 5A, 5B.

According to one aspect, the substrate 202 comprises aluminum alloy,magnesium alloy, glass, ceramic, glass-ceramic composite, or polymericmaterial. The surface of the substrate 202 can be modified or coated toimprove surface characteristics for receiving the seed layer 204.

According to one aspect the seed layer 204 comprises a metal, a metalalloy or an electrically conductive oxide. According to another aspect,the seed layer can comprise a magnetic material and can function as amagnetic soft underlayer (SUL) in the storage media disc 600 (FIGS. 6A,6B). According to one aspect, the seed layer 204 is formed by vapordeposition. According to another aspect, the magnetic soft underlaycomprises FeNi or permalloy. Other known magnetic soft underlayermaterials can also be, for example, FeCoZrTa or FeCoB. The softunderlayer can be amorphous or crystalline.

FIGS. 3A, 3B illustrate a portion of a disc 300 at a second process stepin manufacturing of the storage media disc 600 (FIGS. 6A, 6B). In FIGS.3A, 3B, a pattern of developed photoresist columns 210, 212, 214 arepresent in a recessed field 216 that surrounds the photoresist columns210, 212, 214. The photoresist columns 210, 212, 214 (also called resistcolumns) are arranged in a pattern of bit patterned magnetic media. Theundeveloped photoresist layer 206 (FIGS. 2A, 2B) has beenphotolithographically exposed to a pattern of radiation that defines theshape of the columns 210, 212, 214 and the recess field 216. The exposedphotoresist layer has been photolithographically developed (etched,removed, developed away) to remove photoresist material in the recessedfield 216, leaving the developed photoresist columns 210, 212, 214.According to one aspect, top surfaces of the photoresist columns 210,212, 214 are covered with release monolayer caps 218, 220, 222 formedfrom the release monolayer 208 (FIGS. 2A, 2B). A positive or negativephotolithographic exposure can be used, depending on whether thephotoresist is a positive or negative type of photoresist material.Photolithographic exposure can be accomplished using a mask, a scanningenergy beam, nanopatterning or other known methods of photolithographicexposure.

FIGS. 4A, 4B illustrate a portion of a disc 400 at a third process stepin manufacturing of the storage media disc 600 (FIGS. 6A, 6B). In FIGS.4A, 4B, a filler layer 230 has been applied in the recessed field 216.The filler layer 230 is formed in the recessed field 216 at a time whenmagnetic media is not yet formed on the disc 400. The filler layer 230is not used as an etching mask. According to one aspect, the monolayercaps 218, 220, 222 resist wetting and adhesion by the filler layer 230.Upper surfaces of the monolayer caps 216, 218, 220 remain relativelyfree of filler layer 230.

According to one aspect, the filler layer 230 comprises spun-on-glass(SOG). The filler layer 230 is applied without the use of a stamper onthe filler layer 230. A stamper is not needed because a pattern ofphotoresist columns 210, 212, 214 are present when the filler layer 230is applied, and the pattern of photoresist columns 210, 212, 214function to pattern the filler layer 230 only in the recessed field 216.The filler layer is excluded from the pattern of photoresist columns210, 212, 214.

FIGS. 5A, 5B illustrate a portion of a disc 500 at a fourth process stepin manufacturing of the storage media disc 600 (FIGS. 6A, 6B). In FIGS.5A, 5B, the monolayer caps 218, 220, 222 and the photoresist columns210, 212, 214 have been removed, leaving behind the filler layer 230.The filler layer 230 surrounds recesses 232, 234, 236 formed in thefiller layer that replicate the desired pattern of bit patternedmagnetic media. According to one aspect, the monolayer caps 218, 220,222 and the photoresist columns 210, 212, 214 are removed using an ashand strip process. According to another aspect, the ash and stripprocess oxidizes the filler layer 230. According to one aspect, thefiller layer 230 comprises spun-on-glass, and the ash and strip processheats the spun-on-glass and converts the spun-on-glass to silicondioxide. Alternatively, the spun-on-glass can be converted to its finalform by curing with radiation of appropriate wavelength, dosage andtime.

FIGS. 6A, 6B illustrate a portion of a disc 600 at a fifth process stepin manufacturing of the storage media disc. In FIGS. 6A, 6B, magneticrecording media material 240, 242, 244 is disposed in the recesses 232,234, 236 (FIGS. 5A, 5B). The magnetic recording media material 240, 242,244 arranged in the pattern of the recesses 232, 234, 236 comprises bitpatterned magnetic media. According to one aspect, the recording mediamaterial 240, 242, 244 is grown on the seed layer 204. As illustrated inFIG. 6, the recording media material 240, 242, 244 and the filler layer230 form an upper surface 250. In some applications, the upper surface250 may be sufficiently smooth for flying a transducer head over theupper surface 250. In other applications, the upper surface 250 may notbe sufficiently smooth for flying a transducer head, and the disc 600can be optionally further processed as illustrated in FIGS. 7A, 7B.

According to one aspect, the magnetic recording media material 240, 242,244 is formed by electroless deposition. According to another aspect themagnetic recording media material 240, 242, 244 is formed byelectrodeposition. Other known means of depositing magnetic recordingmedia material in recesses are also contemplated. The magnetic recordingmedia material 240, 242, 244 comprises CoCrPt, FePt, CoCrPtB, CoPtP,FePtP, CoSm or other known magnetic recording media material. Themagnetic media material can be a single material, or it can be amultilayer stack comprising multiple different recording media elements.

FIGS. 7A, 7B illustrate a portion of a disc 700 at an optional sixthprocess step in manufacturing of the storage media disc. In FIGS. 7A,7B, an upper surface 250 has been planarized to provide a smooth, flatsurface planarized surface 260 for flying a transducer head over theplanarized surface 260. Both the magnetic recording media material 240,242, 244 and the filler layer 230 are planarized. According to oneaspect, the planarizing is accomplished using a chemical mechanicalpolishing (CMP) process to planarize the upper surface to a flattenedplane 260. Other planarization processes such as electro-chemicalmechanical planarization (ECMP), gas cluster ion beam etch (GCIBE), lowangle ion beam etch can also be used.

Subsequent to completion of manufacture of either disc 600 or disc 700,additional optional layers can be applied to the upper surface toimprove corrosion resistance, tribology, or flyability characteristicsof the upper surface. According to one aspect, diamond-like carbon (DLC)coating is applied to the upper surface. Discs 600 and 700 comprise bitpatterned magnetic media discs.

It is to be understood that even though numerous characteristics andadvantages of various aspects of the invention have been set forth inthe foregoing description, together with details of the structure andfunction of various aspects of the invention, this disclosure isillustrative only, and changes may be made in detail, especially inmatters of structure and arrangement of parts within the principles ofthe present invention to the full extent indicated by the broad generalmeaning of the terms in which the appended claims are expressed. Forexample, the particular elements may vary depending on the particularapplication for the bit patterned media while maintaining substantiallythe same functionality without departing from the scope and spirit ofthe present invention. In addition, although the preferred aspectsdescribed herein is directed to a disk drive system for bit patternedmagnetic data storage, it will be appreciated by those skilled in theart that the teachings of the present invention can be applied to otherbit patterned magnetic media, without departing from the scope andspirit of the present invention. It is also to be understood that thesame process as described in steps 1 through 6 as described above can berepeated numerous times to obtain a multilayered planar structure ofbit-patterned media in a matrix of filler material. Furthermore, therecording media materials and filler materials can be varied from layerto layer in the multilayer planar structure.

What is claimed is:
 1. An apparatus comprising: a substrate; a seedlayer disposed on the substrate; an interstitial volume surroundingresist columns that are in a pattern of bit patterned magnetic media; afiller layer in the interstitial volume; and means, on top of the resistcolumns and not in the interstitial volume surrounding the resistcolumns, for resisting wetting by a material of the filler layer.
 2. Theapparatus of claim 1 and wherein the seed layer comprises at least oneof a metal, a metal alloy or an electrically conductive oxide.
 3. Theapparatus of claim 1 and wherein the seed layer comprises a magneticmaterial, and wherein the seed layer that comprises the magneticmaterial serves as a magnetic soft underlayer.
 4. The apparatus of claim3 and wherein the magnetic material of the seed layer comprises one ofFeNi, FeCoZrTa or FeCoB.
 5. The apparatus of claim 1 wherein the fillerlayer comprises spun on glass that is converted to silicon dioxide byheating.
 6. An apparatus, comprising: an interstitial volume surroundingresist columns that are in a pattern of bit patterned magnetic media; arelease monolayer on top of the resist columns and not in theinterstitial volume surrounding the resist columns; and a filler layerin the interstitial volume, wherein the release monolayer comprises amaterial that resists wetting by a material of the filler layer.
 7. Theapparatus of claim 6 and wherein the release monolayer is only onemolecule thick.
 8. The apparatus of claim 6 and wherein the filler layercomprises spun on glass that is converted to silicon dioxide by heating.